Vacuum Deposition and Materials Processing Laboratory


Facility


The Vacuum Deposition and Materials Processing Lab is located in Building 535B, B156. The Lab contains a parts preparation room (chem lab), a testing and measuring room, and a thin film deposition and vacuum furnace room. The equipment includes: Resistance and electron-beam thermal evaporation, and rf and dc sputtering systems for thin film deposition; vacuum ovens for soldering, brazing and heat treating; and systems for leak detection, and measuring the physical properties of materials. The Instrumentation Division's Vacuum Deposition and Materials Processing Lab is listed in the Directory of Federal Laboratory and Resources, U.S. Department of Commerce.


Purpose


The Vacuum Deposition and Materials Processing Lab provides special electrical, optical, mechanical and magnetic thin film coatings -- for particle and x-ray detector systems fabricated within the Instrumentation Division; for researchers at BNL's other divisions and departments, accelerators(AGS, NSLS, RHIC, Dynamitron and Tandem Van der Graff) and reactors; and for other outside education/research institutions (i.e. the Materials Science Department at Stony Brook University). The Lab also provides vacuum brazing, heat treatment, and materials consulting services to BNL's divisions and departments. Technical and instructional support is also provided to BNL's Science Education programs.


RF and dc sputtering systems for thin film deposition



Publications and Presentations


  1. V.Kh. Liechtenstein, T.M. Ivkova, E.D. Olshanski, I. Feigenbaum, R. DiNardo, M. Dobeli; Preparation and Evaluation of Thin Diamond-like Carbon Foils for Heavy-ion Tandem Accelerators and Time-of-flight Spectrometers, Nuclear Instruments and Methods in Physics Research A 397(1997) 140-145. (Developed sputtered carbon foils).
  2. M.S. Zhu, R.J. Gambino, M.H. Rafailovich, J. Sokolov, S.A. Schwarz, and R.D. Gomez; Microscopic Magnetic Characterization of Submicron Cobalt Islands Prepared Using Self-Assembled Polymer Masking Technique, IEEE Transactions On Magnetics, VOL. 33 NO. 5, Sept. 1997. (Provided Cobalt films for the Dept. of Materials Science, Stony Brook University).
  3. P. Rehak, G.C. Smith and B. Yu; A Method for Reduction of Parallax Broadening in Gas-Based Position Sensitive Detectors, IEEE Transactions on Nuclear Science, VOL. 44, NO. 3, June 1997. (Provided Aluminum and Chromium coatings on mylar window).
  4. M.S. Zhu, R.J. Gambino, M. Rafailovich, J. Sokolov, H.J. White, A.R. Katz, R.D. Gomez and S.A. Schwarz; Magnetic Nanopattering with Block Polymers, Symposium BB, Materials Research Society 1996 Fall Meeting, Dec. 2-6, Boston, MA. (Prepared Nickel and Cobalt thin films deposited on silicon wafers for the Dept. of Materials Science, Stony Brook University).
  5. T. Tsang; Surface-plasmon-enhanced third-harmonic generation in thin silver films, Optics Letters, Vol. 21, NO. 4, Feb. 15, 1996. (Provided the Silver films).
  6. C.M. Vitus and H.S. Isaacs; XANES Measurements of Oxide Films in Ti Alloys, Symposium 157, The Electrochemical Society 1995 Fall Meeting, Oct. 8-13, Chic. IL. (Prepared sputtered Titanium-alloy films of Niobium, Zirconium and Molybdenum on glass and mylar substrates previously sputtered with 100A of Tantalum).
  7. M.S. Capel, G.C. Smith and B. Yu; One- and Two-dimensional x-ray Detector Systems at NSLS Beam line X12B, for Time-resolved and Static x-ray-diffraction Studies, Rev. Sci. Instrum. 66 (2), Feb. 1995. (Provided Aluminum cathode strips).
  8. C.F. Majkrzak, S. Satija, D.A. Neumann, J.J. Rush, J. Bradshaw, L. Passell and R. DiNardo, Neutron Scattering for Materials Science, edited by S.M. Shapiro, S.C. Moss, and J.D. Jorgensen (Materials Research Society Symp. Proc. 166, 1990). (Prepared thin films).
  9. H. Homma, R.P. DiNardo, Y. You, L. Passell, J.D. Axe, C.F. Majkrzak; Structural Study of Fe/W Superlattices. Presented at March, 1989 Meeting of American Physical Society. (Developed multilayer films of sputtered Iron and Tungsten).
  10. R.P. DiNardo, C.F. Majkrzak, and D.A. Neumann; Fabrication of Neutron Polarizing Fe-Si Multilayers by Sputtering. Proc. SPIE (International Society for Optical Engineering) 983, 149-154, 1989.(Developed multilayer films of sputtered Iron and Silicon).
  11. C.F. Majkrzak, D. Neumann, J. Copley and R.P. DiNardo; Fe-W Supermirrors for Polarizing Neutrons. Mater. Res. Soc. Symp. Proc. Vol. 103, 115-120, 1988. (Developed multilayer films of sputtered Iron and Tungsten).
  12. R. Beuttenmuller, V. Bisi, E. Chesi, R.P. DiNardo, M.J. Esten, P. Giubellino, H.W. Kraner, T.W. Ludlum, F. Meddi, F. Piuz, V.A. Polychronakos, V. Radeka, L. Ramello, R. Roosen, and A. Tschulik; Silicon Position Sensitive Detectors for the HELIOS (NA34) Experiment; BNL 37899; Pres. 4th European Symp. on Semiconductor Detectors, 3-5 March (1986), Munich, W. Germany; Nuclear Instruments and Methods, 500-510 (1987). (Prepared thin films).
  13. R.P. DiNardo, P.Z. Takacs, C.F. Majkrzak, and P.M. Stefan; Sputter Deposition System for Controlled Fabrication of Multilayers; Proc. SPIE, 30-35 (1985). (Developed vacuum system to produce stacked multilayer films).
  14. A. Piotrowski, R.L. Gill and D.C. McDonald; A New Tristan Thermal Ion Source. Nuclear Instr. and Methods in Physics Research 224(1984) 1-4. (Provided 100 foot lengths of mylar tape(used as the ion collector) continuously coated with electron-beam evaporated Aluminum(~1500Å).
  15. J.B. Blewett, L. Blumberg, A.J. Campillo, R.P. DiNardo, H.C. Hsieh, S. Krinsky, A. Luccio, C. Pellegrini, J. Schuchman, P.Z. Takacs, and A. van Steenbergen; Free Electron Laser Experiment at the NSLS 700 MeV Electron Storage Ring; BNL 29209; Proc. 1981 Particle Accelerator Conf., Wash. DC, 11-13 March(1981); IEEE Trans. Nuc. Sci. NS-28, No. 3, June (1981) 3166-3168). (Provided collaboration).



Last Modified: Thursday, 16-Feb-2006 10:47:04 EST