Located within the Instrumentation Division, the Optical Metrology lab (OML) has been actively involved in the improvement of the quality of optical components in use at synchrotron radiation beamlines throughout the world. Established in 1983, the OML has pioneered the use of non-contact optical profiling instruments to measure the surface figure and surface roughness on large aspheric mirrors used to reflect x-rays at extreme grazing incidence angles. A collaboration with Dr. Eugene L. Church from Picatinny Arsenal, Dover, NJ, has resulted in an improved understanding of the fundamental nature of surface roughness in terms of fractal geometry and in comprehensive models of instrument performance.
The activities of the OML divide into three basic areas:
Current Long Trace Profiler (LTP) installation in Optical Metrology Lab. A 1 meter long Si cylindrical mirror is shown under the test. The "open architecture" optics board allows for rapid prototyping and testing of various external and internal components.
Last Modified: Wednesday, 06-Feb-2013 22:33:56 EST